Dr. Matthew Goeckner will be our speaker.
The title of his talk is “Understanding the Fluorocarbon Cycle in Plasma Environments”.
The seminar will be this Friday, April 5th in SLC 2.303 at 12:00 (noon).
Abstract: Fluorocarbon chemistries are commonly used in plasma etch and deposition systems. Such systems are complex in nature - with reaction pathways that are poorly understood - and often with unknown chamber dependency. This complexity forces people in industrial environments to develop “best” processes for solutions needed "yesterday" through designed experiments, historical knowledge and brute force. Unfortunately, the "best" processes of today will likely not work tomorrow, as technology and hence process requirements race forward. The net result is that in an industrial environment, the pursuit of true understanding of the process can seem superfluous. However, a better understanding of the plasma environment could greatly reduce the need for brute force designed experiments, leading to faster and better breakthroughs at lower costs. Such fundamental understanding can also enable modeling that should reduce chamber dependency issues - or most specifically allow better monitoring of the important parameters causing chamber dependency. In this presentation, we will give some examples of both experimental and modeling efforts to gain a fuller understanding of the Fluorocarbon Cycle. We will in turn use this information to show how this knowledge can be used to optimize one aspect of a specific plasma etch process, specifically reducing undercut in TMDSE.