A laser source pattern generator used for making photomasks. Resolution limit of .6 microns.
Usually 4 inch and 5 inch photomasks are patterned, however, has alignment capability to direct write on silicon wafers.
User Manual coming soon...
Please use the DWL 66 Write Time Chart for calculating the approximate write time for making a mask. Use this information to schedule the appropriate amount of time on the online scheduler for the DWL66. You will need to know the field area and which lens (2mm, 4mm, or 10mm) you plan to use.