JETFIRST 200 RAPID THERMAL PROCESSOR

 

The JetFirst 200 is a halogen lamp heated Rapid Thermal Process system that is capable of rapidly  heating samples from ambient up to 1200 C. The tool is provided with closed loop temperature control set by either a thermocouple or optical pyrometer. The reaction chamber can accommodate wafers up to 200 mm in diameter with the option of either a silicon or silicon carbide susceptor. Available chamber ambients are argon, nitrogen, oxygen, forming gas, or vacuum. A software interface provides easy recipe programming and monitoring of the system.

 

 

User Manual

Calibrations

December 2009 Cals

 

Updated: 08-Dec-2009