PLASMA-THERM, PLASMA DIELECTRIC & DEEP SILICON ETCH

The PLASMA-THERM, formerly Oerlikon, plasma dielectric and DSE (Deep Silicon Etch) etcher is configured for etching films using fluorine based chemistries. Presently, SF6, CHF3, and C4F8 precursors are installed on the tool. The tool is equipped with a vacuum load-lock to prevent potentially toxic etch by-products from venting to the Cleanroom during sample load and unload.

 

User Manual

Process Data

Silicon Nitride

Silicon Oxide

Control Charts

Silicon Nitride

Silicon Oxide

 

Updated: 2013-04-09