PLASMA-THERM ICP

The Plasma-Therm plasma ICP etcher is configured for etching metallic films using chlorine based chemistries. Presently, Cl2, BCl3, O2, and Ar are installed on the tool. The tool is equipped with a vacuum load-lock to prevent potentially toxic etch by-products from venting to the Cleanroom during sample load and unload.

User Manual

 

Process Runs

Aluminum

Polysilicon

Control Charts

Aluminum

Polysilicon

 

Updated: 2013-04-26