TYSTAR DIFFUSION /OXIDATION FURNACE
The new four-stack Tystar atmospheric furnace system provides basic oxidation and annealing capabilities needed for silicon transistor and MEMS fabrication on wafers up to 150 mm in diameter. The system is presently configured with two oxidation tubes and two tubes for solid-source diffusion and annealing of N and P type dopants. The furnaces are fully computer-controlled and feature automated load/unload stations and remote recipe editing and download.
Process Data
T5: General Oxidation 10nm Oxide
Control Charts
MOSCAP Data
Updated: 2008-12-12
