The Avenger Basic Spin Rinse Dryer is a dual chamber wafer washer system with 3” and 4” diameter substrate capabilities. The substrates are held in a standard Teflon wafer boat that is balanced along with the rotor frames by the manufacturer. This means that you can only spin your substrates using the designated boat or an identical substitute. The system can run any of 5 different spin rinse programs. There are two basic default programs set into the microprocessor memory: Program “0” is a spin-only dry program and Program “1” is a rinse and subsequent dry program. This tool is run by a microprocessor behind a touch screen, so programs can be easily changed and assigned to a spinner module.