My work in scatterometry began several years ago with the idea that I could devise a method for data analysis that would circumvent the need to generate a large database.   I was able to do that and have published several articles regarding that method with my graduate students.  Below is a list of them:

     1)   "Linearized Inversion of Scatterometric Data to obtain Surface Profile Information", Emmanuel M. Drege, Jeffrey A. Reed, and Dale M. Byrne, Optical Engineering, Vol 41, No. 1, pp.225-236, Jan. 2002
     2)   "Profile Parameter Accuracy Determined from Scatterometric Measurements", Rayan M. Al Assaad, Emmanuel M. Drege, and Dale M. Byrne, Design, Process Integration, and Characterization for Microelectronics, Alexander Starikov, and Kenneth W. Tobin, eds., Proc. of SPIE 4692A, pp.17-28, 2002.
     3)   "Mathematical Analyses of Inverse Scatterometry", Emmanuel M. Drege, Rayan M. Al Assaad, and Dale M. Byrne, Metrology, Inspection, and Process Control for Microlithography XVI, Daniel J. Herr, ed., Proc. of SPIE 4689, pp. 151-162, 2002.

More recently I've concentrated on the general aspects of "inversion problems," specifically as they apply to analysis of scatterometric data.  A graduate student and myself are working on some new procedures to analyze the data, concentrating on the structural information that is available in a given data set.  Some initial exciting results of this work include the ability to derive a large number of "simulated" measurements from a few actual measurements, and then invert using the TOTAL set of both actual and simulated measurements.  The results are quite encouraging and appear to yield a quality inversion.

During my retirement I plan to continue investigating the nuances of inversion theory, as applied to scatterometric data as well as other types of experimental data.