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Home Research Publications Presentations
Current Research.
My current
research focuses on the study of physical and chemical properties of surfaces
and interfaces mainly applied to electronic materials. More specifically to the
correlation of chemical bonding and atomic arrangement to the electrical
characteristics of metal-oxide-semiconductor structures. Mainly focused on
high-k dielectrics such as HfO2, Al2O3 and La2O3
grown on high-mobility substrates such as Ge, GaAs and InGaAs.
Research Experience.
In the
last few years I have worked on the passivation of Si surfaces using monolayers
of Sr and Se as well as in the interface properties of high-k dielectrics on
silicon. These studies were carried out using XPS, UPS, electron diffraction,
x-ray diffraction and x-ray absorption spectroscopy. Specialty areas include:
·
Surface Science: Chemical and structural analysis using
XPS and other electron spectroscopies, synchrotron XPS and XAS, electron
diffraction (RHEED and LEED).
·
Growth of ultra-thin layers including deposition methods
as MBE, PVD, PVD Sputter, ALD and thermal processing.
·
Surface passivation of semiconductors: Si, Ge and III-Vs.
·
Electrical characterization of Metal-Oxide-Semiconductor
devices.
Future Research Directions.
In the
near future I will explore research topics in the area of renewable energy with
the purpose of contributing to the important necessity for energy harvesting
and storage. The two major topics will be “organic solar cells” and “complex
metal hydrides”. Organic solar cells fabrication is a ~10 times cheaper than
those based on silicon but efficiencies are in great disadvantage. In this
regard a great research opportunity is, for example, improving the electrical
properties at the semiconductor/contact interfaces to avoid degradation. The
technology for hydrogen fuel cell has reached some degree of maturity; however
hydrogen storage is still an open question. A safer alternative to H2
gas storage (H2 pressure ~ 10,000 psi) is the use of complex metal
hydrides as a mean of storing hydrogen. This field requires a great effort to
make the metal hydrides a feasible technology for the future.