Articles in refereed journals

  1. M.J. Goeckner and J. Goree, Laser-induced fluorescence measurements of plasma ion temperatures: corrections for saturation broadening, Journal of Vacuum Science and Technology A 7, 977-981 (1989)

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  2. M.J. Goeckner and J. Goree, Comment on 'Optical carriage for laser-induced fluorescence in a magnetized plasma', Review of Scientific Instruments 60, 3830 - 3831 (1989)

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  3. T.E. Sheridan, M.J. Goeckner and J. Goree, Model of energetic electron transport in magnetron discharges, Journal of Vacuum Science and Technology A 8, 30-37 (1990)

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  4. T.E. Sheridan, M.J. Goeckner and J. Goree, Electron and ion transport in magnetron plasmas, Journal of Vacuum Science and Technology A 8, 1623-1626 (1990)

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  5. J.E. Miranda, M.J. Goeckner, J. Goree and T.E. Sheridan, Monte Carlo simulation of ionization in a magnetron plasma, Journal of Vacuum Science and Technology A 8, 1627-1631 (1990)

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  6. M.J. Goeckner, J. Goree and T.E. Sheridan, Laser-induced fluorescence characterization of ions in a magnetron plasma, Journal of Vacuum Science and Technology A 8, 3920-3924 (1990)

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  7. T.E. Sheridan, M.J. Goeckner and J. Goree, Pressure dependence of ionization efficiency in sputtering magnetrons, Applied Physics Letters 57, 2080-2082 (1990)

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  8. M.J. Goeckner, J. Goree and T.E. Sheridan, Monte Carlo simulation of ions in a magnetron plasma, IEEE Transactions on Plasma Science 19, 301-308 (1991)

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  9. M.J. Goeckner, J. Goree and T.E. Sheridan, Laser-induced fluorescence characterization of ions in a multidipole confined filament discharge, Physics of Fluids B 3, 2913-2921 (1991)

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  10. T.E. Sheridan, M.J. Goeckner and J. Goree, Observation of two-temperature electrons in a sputtering magnetron plasma, Journal of Vacuum Science and Technology A 9, 688-690 (1991)

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  11. M.J. Goeckner, J. Goree and T.E. Sheridan, Ion impact etch anisotropy downstream from diffusion plasma sources, Journal of Vacuum Science and Technology A 9, 3178-3180 (1991)

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  12. M.J. Goeckner, J. Goree and T.E. Sheridan, Measurements of ion velocity and density in the plasma sheath, Physics of Fluids B 4, 1663-1670 (1992)

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  13. J.A. Meyer, G-H. Kim, M.J. Goeckner and N. Hershkowitz, Measurements of the presheath in an electron cyclotron resonance etching device, Plasma Sources Science and Technology 1, 147-150 (1992)

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  14. M.J. Goeckner, J. Goree and T.E. Sheridan, Saturation broadening in laser-induced fluorescence from plasma ions, Review of Scientific Instruments 64, 996-1000 (1993)

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  15. M.J. Goeckner and R.A. Breun, Using Fourier transform infrared absorption spectrometry to probe the injected neutral gas in a plasma having a high ionization fraction, Journal of Vacuum Science and Technology A 11, 689-693 (1993)

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  16. M.J. Goeckner, J.A Meyer, G-H. Kim, J.S. Jenq, A. Matthews, J.W. Taylor and R.A. Breun, Role of contaminates in electron cyclotron resonance plasmas, Journal of Vacuum Science and Technology A 11, 2543-2552 (1993)

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  17. M.J. Goeckner, Shamim M. Malik, J.R. Conrad and R.A. Breun, Laser-induced fluorescence measurement of the dynamics of a pulsed planar sheath, Physics of Plasmas 1, 1064-1074 (1994)

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  18. L. Zhang, J.L. Shohet, D. Dallmann, J.R. Booske, R.R. Speth, K. Shenai, M.J. Goeckner, J.B. Kruger, P. Rissman, J.E. Turner, E. Perez-Albuerne, S. Lee and N. Meyyappan, Low-energy separation by implantation of oxygen structures via plasma source ion implantation, Applied Physics Letters 65, 962-964 (1994)

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  19. R.R. Speth, G.A. Emmert, and M.J. Goeckner, The influence of the high voltage pulse shape on the plasma source ion implantation process, Applied Physics Letters 65, 2272-2274 (1994)

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  20. E. R. Keiter, W.N.G. Hitchon and M.J. Goeckner, A kinetic model of pulsed sheaths, Physics of Plasmas 1, 3709-3712 (1994)

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  21. M.J. Goeckner, M.A. Henderson, J.A. Meyer and R.A. Breun, Fourier transform infrared absorption spectrometry measurements of a CF4 discharge in an electron cyclotron resonance reactor, Journal of Vacuum Science and Technology A 12, 3120-3125 (1994)

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  22. L. Zhang, J.H. Booske, R.F. Cooper, J.L. Shohet, J.R. Jacobs, F.S.B. Anderson, M.J. Goeckner, E.B. Wicksberg and G. Was, Plasma-immersed oxygen ion implantation of iron-doped glass for nonmetallic magnetic hard disk, Journal of Vacuum Science and Technology B 12, 3342-3346 (1994)

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  23. T.E. Sheridan and M.J. Goeckner, Collisional sheath dynamics, Journal of Applied Physics 77, 4967- 4972 (1995)

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  24. M.J. Goeckner, R.P. Fetherston, W.N.G. Hitchon, N.C. Horswill, E.R. Keiter, Shamim M. M., R.A. Breun, J.R. Conrad and T.E. Sheridan, Dynamics of a collisional pulsed planar sheath, Physical Review E 51, 3760-3763 (1995)

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  25. T.E. Sheridan, M.J. Goeckner and J. Goree, Electron distribution functions in a sputtering magnetron discharge, Japanese Journal of Applied Physics 34, 4977-4982 (1995)

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  26. J. Park, T.K. Bennett, M.J. Goeckner and S.A. Cohen, Plasma-neutral interaction in thermally collapsed plasma, Journal of Nuclear Materials 241-243, 489-493 (1997)

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  27. M.J. Goeckner, T.K. Bennett and S.A. Cohen, A source of hyperthermal neutrals for materials processing, Applied Physics Letters 71, 980-982 (1997)

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  28. T.E. Sheridan, M.J. Goeckner and J. Goree, Electron velocity distribution functions in a sputtering magnetron discharge in the ExB direction, Journal of Vacuum Science and Technology A 16, 2173-2176 (1998)

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  29. M.J. Goeckner, S.B. Felch, J. Weeman, S. Mehta and J.S. Reedholm, Evaluation of Charging Damage Test Structures for Ion Implantation Processes, Journal of Vacuum Science and Technology A 17, 1501-1509 (1999)

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  30. M.J. Goeckner and N.A. Goeckner, Fourier-Transform Infrared Measurements of CHF3/O2 discharges in an electron cyclotron resonance reactor, Journal of Vacuum Science and Technology A 17, 2586-2592 (1999)

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  31. M.J. Goeckner, S.B. Felch, Z. Fang, A. Oberhofer, V.K.F Chia, G.R. Mount, M Poulakos and W.A Keenan, Plasma doping for shallow junctions, Journal of Vacuum Science and Technology B 17, 2290-2293 (1999)

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  32. M.J. Goeckner, S.B. Felch, Z. Fang, A. Oberhofer, V.K.F. Chia, G.R. Mount, M. Poulakos and W.A. Keenan, Profiling of Ultra-Shallow Junctions, Journal of Vacuum Science and Technology B 18, 472-476 (2000)

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  33. Zhehui Wang, Samuel A. Cohen, David N. Ruzic, M. J. Goeckner, Nitrogen atom energy distributions in a hollow-cathode planar sputtering magnetron, Physical Review E 61, 1904-1911 (2000)

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  34. S. Srinivasan, J. Marquis, L. Pratti, M.H. Khater, M.J. Goeckner and L.J. Overzet, The effects on plasma properties of a current node on inductively coupled plasma sources, Plasma Sources Science and Technology 12, 432-442 (2003).

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  35. M. J. Goeckner, J.M. Marquis, B.J. Markham, A.K. Jindal, E.A. Joseph, B.-S. Zhou, A modified Gaseous Electronics Conference Reference Cell for the study of plasma-surface-gas interactions, Review of Scientific Instrumentation 75, 884-891 (2004)

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  36. E. A. Joseph, B. Zhou, S. P. Sant, L. J. Overzet, and M. J. Goeckner, Investigation and modeling of plasma-wall interactions in inductively coupled fluorocarbon plasmas, Journal of Vacuum Science and Technology A 22, 689-697 (2004).

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  37. S. P. Sant, E. A. Joseph, B. Zhou, L. J. Overzet, and M. J. Goeckner, Langmuir Probe Measurements and Simulations of Argon plasma in the modified Gaseous Electronic Conference (mGEC) Reference Cell, Journal of Vacuum Science and Technology A In revision (2004).

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  38. S. P. Sant, E. A. Joseph, B. Zhou, L. J. Overzet, and M. J. Goeckner, Influence of Chamber dimensions on the plasma chemistry of electronegative CF4 plasma, Journal of Vacuum Science and Technology A In preparation (2004).

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  39. A.K. Jindal, L. J. Overzet, and M. J. Goeckner, FTIR Characterization of electron-ion and ion-ion etch chemistry in a chlorine discharge downstream of an inductively coupled reactor, Journal of Vacuum Science and Technology A In preparation (2004).

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  40. A.K. Jindal, L. J. Overzet, and M. J. Goeckner, FTIR Characterization of a pulsed Butadenye plasma, Journal of Vacuum Science and Technology A In preparation (2004).

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  41. B. Zhou, E. A. Joseph, S. P. Sant, L. J. Overzet, and M. J. Goeckner, , Journal of Vacuum Science and Technology A submitted (2004).

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    Other referred writings (not including abstracts): Patents Issued (from US Patent office. Other, foreign, patents are 'copies' of US patents and are not listed here.)

  42. Matthew J. Goeckner and Ziwei Fang, Hollow cathode for plasma doping system US Patent number: US6500496, Issued: Dec. 31, 2002, Filed: Oct. 25, 2000

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  43. Matthew J. Goeckner and Charles E. Van Wagoner, Method and apparatus for eliminating displacement current from current measurements in a plasma processing system, US Patent number: US6433553 Issued: Aug. 13, 2002, Filed: Oct. 27, 1999

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  44. Matthew J. Goeckner and Ziwei Fang, Method and apparatus for low voltage plasma doping using dual pulses, US Patent number: US6335536, Issued: Jan. 1, 2002, Filed: Oct. 27, 1999

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  45. Ziwei Fang and Matthew J. Goeckner, Dose monitor for plasma doping system, US Patent number US6300643, Issued: Oct. 9, 2001, Filed: Dec. 6, 1999

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  46. Matthew J. Goeckner and Ziwei Fang, Hollow cathode for plasma doping system, US Patent number: US6182604, Issued: Feb. 6, 2001, Filed: Oct. 27, 1999

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  47. Reuel B. Liebert, Bjorn O. Pedersen, and Matthew J. Goeckner, Dose monitor for plasma doping system, US Patent number: US6020592, Issued: Feb. 1, 2000, Filed: Aug. 3, 1998

    48. Patent Applications/Disclosures

  48. M.J. Goeckner, L.J. Overzet, A. Jindal and A. Prengler (2003)

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  49. M.J. Goeckner, S.S. Villareal, F. Maloberti, J.B. Lee, J. Coogan (2003)

    50. Invited or refereed talks/presentations to professional meetings and seminars or colloquia assemblies:

  50. J. Goree and M.J. Goeckner, Laser-induced fluorescence measurement of plasma ion distribution functions, Proceedings of the NATO Advanced Study Institute on Plasma Surface Interactions and Plasma Processing of Materials, Alicate, Spain, Sept. 1988 (Martinus Nijhoff Publishers, Netherlands, 1989)

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  51. M.J. Goeckner, J. Goree, and T.E. Sheridan, Laser-induced fluorescence measurement of plasma ion distribution functions: correcting for spatially inhomogeneous laser intensities, Advances in Laser Science IV: Proceedings of the Fourth International Laser Science Conference, Atlanta, GA, Oct. 1988 (American Institute of Physics, 1989), pp. 761-766.

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  52. M.J. Goeckner (invited), Fourier Transform Infrared Spectroscopy in processing plasmas, Swarthmore, Department of Physics and Astronomy Colloquim, Oct 6, 1995.

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  53. M.J. Goeckner, T.K. Bennett, Jaeyoung Park and S.A. Cohen, Reduction of residual charge in surface-neutralization-based neutral beams, Proceedings of the 2nd International Symposium on Plasma Process-Induced Damage Monterey, CA, May 12-14, 1997.

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  54. D. Lenoble, M.J. Goeckner, S.B. Felch, Z. Fang, J. Galvier and A. Grouillet, Evaluation of plasma doping for sub-0.18 µm devices, Proceedings of the 12th International Conference on Ion implantation Technology '98 Kyoto, Jp, June 22-26, 1998.

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  55. J.M. Ha, J.W. Park, W.S. Kim, W.S. Song, H.J. Song, K. Fujihara, H.K. Kang, S. Felch, M.J. Goeckner, D.H. Ko and G.C. Lee, High performance pMOSFET with BF3 plasma doped gate/source/drain and S/D extension, 1998 IEEE International Electron Devices Meeting (IEDM), San Francisco, CA December 6-9, 1998, pp. 639-642.

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  56. D. Lenoble, J. Alieu, A. Grouillet, R. Gwoziecki, A. Halimaoui, T. Skotnicki, S.B. Felch, M.J. Goeckner, Z. Fang, S. Mehta and M. Haond, Enhanced performance in 0.15 µm pMOSFET fabricated using plasma doping, 1999 IEEE Symposium on VLSI Circuits, Japan June, 17-19 1999.

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  57. M.J. Goeckner, S.B. Felch, Z. Fang, and J. Weeman, Evaluation of charging damage in a plasma doping system, Proceedings of the 4th International Symposium on Plasma Process-Induced Damage, Monterey, CA, May 9-11, 1999.

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  58. M.J. Goeckner (invited) S.B. Felch, J. Weeman, and J. Erhardt, Evaluation of Tests to Examine Charging Damage in Ion Implantation and Plasma Processes, National Ion Implant Users Group meeting, Austin TX, Oct. 21, 1999.

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  59. M.J. Goeckner, S.B. Felch, J. Weeman, and J. Erhardt, Evaluation of tests to examine charging damage in ion implantation and plasma processes: using controlled stress environments, Proceedings of the 2000 International Conference on Ion Implantation Technology, Alpbach, Austria, Sept. 17-22, 2000 - In press. (Still not available through IEEE)

    60. [Return to main page]

  60. Z. Fang, B-W Koo, S.B. Felch, Y. Lei, L.J. Overzet and M.J. Goeckner, Study of pulsed plasma doping by Langmuir probe and ion mass-energy analyzer, Proceedings of the 2002 International Conference on Ion Implantation Technology, Taos, New Mexico, Oct. 2002 - In press.

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Contributed (unrefereed) abstracts and/or oral presentations at professional meetings:

  1. J. Goree and M.J. Goeckner, Laser-induced fluorescence measurements of ion temperature in multidipole plasmas, American Physical Society - Division of Plasma Physics, San Diego, CA, Oct./Nov. 1987 Bulletin of the American Physical Society 32, 1941 (1987)

    2. [Return to main page]

  2. M.J. Goeckner and J. Goree, Laser-induced fluorescence measurement of plasma ion distribution functions: corrections for power saturation, American Vacuum Society 35th National Symposium, Atlanta, GA, Oct. 1988

    3. [Return to main page]

  3. M.J. Goeckner and J. Goree, Laser-induced fluorescence measurement of plasma ion distribution functions: correcting for spatially inhomogeneous laser intensities, Fourth International Laser Science Conference, Atlanta, GA, Oct. 1988, Bulletin of the American Physical Society 33, 1658 (1988)

    4. [Return to main page]

  4. M.J. Goeckner and J. Goree, Pulsed laser fluorescence measurement of ion distribution functions: avoiding saturation broadening, American Physical Society - Division of Plasma Physics, Hollywood, FL, Nov. 1988, Bulletin of the American Physical Society 33, 2052 (1988)

    5. [Return to main page]

  5. M.J. Goeckner, J. Goree and T.E. Sheridan, Laser-induced fluorescence characterization of ions in a magnetron plasma, American Vacuum Society 36th National Symposium, Boston, MA, Oct. 1989

    6. [Return to main page]

  6. T.E. Sheridan M.J. Goeckner and J. Goree, Ion limited transport in magnetron plasmas, American Vacuum Society 36th National Symposium, Boston, MA, Oct. 1989

    7. [Return to main page]

  7. J.E. Miranda, M.J. Goeckner, J. Goree and T.E. Sheridan, Ionization distributions in a magnetron plasma, American Vacuum Society 36th National Symposium, Boston, MA, Oct. 1989

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  8. M.J. Goeckner, J. Goree and T.E. Sheridan, LIF and probe characterization of sputtering magnetron discharges, American Physical Society - Division of Plasma Physics, Anaheim, CA, Nov. 1989, Bulletin of the American Physical Society 34, 2029 (1989)

    9. [Return to main page]

  9. J. Goree, M.J. Goeckner and T.E. Sheridan, Sputtering magnetron discharges, American Physical Society - Division of Plasma Physics, Anaheim, CA, Nov. 1989, Bulletin of the American Physical Society 34, 2029 (1989)

    10. [Return to main page]

  10. T.E. Sheridan, M.J. Goeckner and J. Goree, Monte carlo simulation of sputtering magnetron discharges, American Physical Society - Division of Plasma Physics, Anaheim, CA, Nov. 1989, Bulletin of the American Physical Society 34, 2029 (1989)

    11. [Return to main page]

  11. M.J. Goeckner, J. Goree and T.E. Sheridan, LIF characterization of a dc multidipole discharge, Gaseous Electronics Conference, Champaign, IL, Oct. 1990, Bulletin of the American Physical Society 36, 215 (1991)

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  12. J. Goree, M.J. Goeckner and T.E. Sheridan, Magnetron plasma transport simulation, Gaseous Electronics Conference, Champaign, IL, Oct. 1990, Bulletin of the American Physical Society 36, 199 (1991)

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  13. M.J. Goeckner, J. Goree and T.E. Sheridan, Monte Carlo simulation of ions in a magnetron plasma, American Vacuum Society 37th National Symposium, Toronto, Canada, Oct. 1990

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  14. T.E. Sheridan, M.J. Goeckner and J. Goree, Observation of two-temperature electrons in a sputtering magnetron plasma, American Vacuum Society 37th National Symposium, Toronto, Canada, Oct. 1990

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  15. M.J. Goeckner, J. Goree and T.E. Sheridan, LIF characterization of a multidipole filament discharge, American Physical Society - Division of Plasma Physics, Cincinnati, OH, Nov. 1990, Bulletin of the American Physical Society 35, 2016 (1990)

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  16. T.E. Sheridan, M.J. Goeckner and J. Goree, Planar probe characterization of a sputtering magnetron plasma, American Physical Society - Division of Plasma Physics, Cincinnati, OH, Nov. 1990, Bulletin of the American Physical Society 35, 2016 (1990)

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  17. M.J. Goeckner, J.A Meyer, G-H. Kim, J.S. Jenq, A. Matthews and R.A. Breun, The influence of contaminates during the seasoning of an ECR etcher, American Vacuum Society 39th National Symposium, Chicago, IL, Oct. 1992

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  18. D. Beale, A. Wendt and M.J. Goeckner, Spatially resolved optical emission of a methyl methacrylate deposition, American Vacuum Society 39th National Symposium, Chicago, IL, Oct. 1992

    19. [Return to main page]

  19. M.J. Goeckner, Shamim M. Malik, J.R. Conrad and R.A. Breun, Laser-induced fluorescence measurement of ion dynamics of a pulsed plasma sheath, International Workshop on Plasma-Based Ion Implantation, Madison, WI, Aug. 1993

    20. [Return to main page]

  20. M.J. Goeckner, Shamim M. Malik, J.R. Conrad and R.A. Breun, LIF measurement of the dynamics of pulsed planar sheaths, American Physical Society - Division of Plasma Physics, St. Louis, MO, Oct. 1993, Bulletin of the American Physical Society 38, 1890 (1993)

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  21. L.J. Mahoney, S.G. Yulke, J.L Shohet, and M.J. Goeckner, FTIR spectroscopy measurements of CF4 And C2F6 concentrations in a planar rf inductively-coupled plasma, IEEE International Conference on Plasma Science, Santa Fe, NM, June 1994

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  22. J.H. Booske, L. Zhang, R.F. Cooper, J.L. Shohet, K. Shenai, D. Dallman, M.J. Goeckner, R Breun, W.N.G. Hitchon, E.B. Wicksberg, R. Speth, J.R. Jacobs and G. Was, Buried ceramic layer in glass and silicon using plasma source ion implantation, IEEE International Conference on Plasma Science, Santa Fe, NM, June 1994

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  23. S.A. Cohen, T. Bennett, D. Carroll, T.K. Chu, M.J. Goeckner, P. Lucas, J Park and Z. Wang, An undergraduate laboratory course taught in the concentrated-study format, American Physical Society - Division of Plasma Physics, Louisville, KY, Nov. 1995, Bulletin of the American Physical Society 40, 1689 (1995)

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  24. M.J. Goeckner and S.A. Cohen, A plasma-based source of hyperthermal neutral atoms, American Physical Society - Division of Plasma Physics, Louisville, KY, Nov. 1995, Bulletin of the American Physical Society 40, 1773 (1995)

    25. [Return to main page]

  25. M.J. Goeckner, J Park, T.K. Bennett and S.A. Cohen, Ashing of photoresist with a plasma-based source of hyperthermal neutral atoms, American Vacuum Society 43rd National Symposium, Philadelphia, PA, Oct. 1996

    26. [Return to main page]

  26. Z.H. Wang M.J. Goeckner and S.A. Cohen, Development and measurement of hyperthermal neutral beams, American Vacuum Society 43rd National Symposium, Philadelphia, PA, Oct. 1996

    27. [Return to main page]

  27. J Park, T.K. Bennett, M.J. Goeckner and S.A. Cohen, Formation of a steep electron temperature gradient and radiation zone in a high density linear plasma device, American Vacuum Society 43rd National Symposium, Philadelphia, PA, Oct. 1996

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  28. S.A. Cohen, Jaeyoung Park, T. Bennett and M.J. Goeckner, Particle and heat transport on thermally collapsed plasmas in a linear divertor simulator, American Physical Society - Division of Plasma Physics, Denver, CO, Nov. 1996, Bulletin of the American Physical Society 41, (1996)

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  29. Jaeyoung Park, S.A. Cohen, T. Bennett and M.J. Goeckner, Studies of emission spectroscopy on thermally collapsed plasmas in a linear divertor simulator, American Physical Society - Division of Plasma Physics, Denver, CO, Nov. 1996, Bulletin of the American Physical Society 41, (1996)

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  30. Z.H. Wang, S.A. Cohen and M.J. Goeckner, Detection of hyperthermal neutral beams, American Physical Society - Division of Plasma Physics, Denver, CO, Nov. 1996, Bulletin of the American Physical Society 41, (1996)

    31. [Return to main page]

  31. M.J. Goeckner, Jaeyoung Park, T.K. Bennett, Z. Wang and S.A. Cohen, Characterization of a plasma-based source of hyperthermal neutrals, American Physical Society - Division of Plasma Physics, Denver, CO, Nov. 1996, Bulletin of the American Physical Society 41, (1996)

    32. [Return to main page]

  32. Zhehui Wang, S. A. Cohen and M. J. Goeckner, Measurements of velocities of energetic neutral atoms in a dc magnetron, American Physical Society - Division of Plasma Physics, Pittsburgh, PA, Nov. 1997, Bulletin of the American Physical Society 42, (1997)

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  33. Ce Li, S. A. Cohen and M. J. Goeckner, Ashing of photoresist with a plasma-based source of hyperthermal neutral atoms, American Physical Society - Division of Plasma Physics, Pittsburgh, PA, Nov. 1997, Bulletin of the American Physical Society 42, (1997)

    34. [Return to main page]

  34. M.J. Goeckner, T.K. Bennett, S.A. Cohen and J. Park, Plasma characteristics in a surface-neutralization-based neutral beam, American Vacuum Society 44th National Symposium, San Jose, CA, Oct. 1997

    35. [Return to main page]

  35. D. Lenoble, M.J. Goeckner, S.B. Felch, J. Galvier and A. Grouillet, Evaluation of plasma doping for sub-0.18 µm devices, 12th International Conference on Ion implantation Technology '98, Kyoto, JP, June 1998

    36. [Return to main page]

  36. M.J. Goeckner, S.B. Felch, J. Weeman, S. Mehta and J.S. Reedholm, Evaluation of charging damage test structures for ion implantation processes, American Vacuum Society 45th National Symposium, Baltimore, MD, on November 2-6, 1998.

    37. [Return to main page]

  37. S. Felch, A. Oberhofer, M. Goeckner, V. Chia, M. Poulakos, W. A. Keenan, and B. Gordon, Electrical profiling of ultra-shallow junctions, Fifth International Workshop on the Measurement, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors, Research Triangle Park, NC, on March 28-31, 1999.

    38. [Return to main page]

  38. S.B. Felch, M.J. Goeckner, Z. Fang, D. Lenoble, J. Galvier, A. Grouillet, G.C-F. Yeap, D. Bang, M-R. Lin, Plasma doping for shallow junctions, 1st International Conference on Advanced Materials and Processes for Microelectronics, San Jose, CA, on March 15-19, 1999.

    39. [Return to main page]

  39. M.J. Goeckner, S.B. Felch, J. Weeman, and J. Erhardt, Evaluation of tests to examine charging damage in ion implantation and plasma processes: using controlled stress environments, Proceedings of the 2000 International Conference on Ion Implantation Technology, Alpbach, Austria, Sept. 17-22, 2000

    40. [Return to main page]

  40. M.J. Goeckner, J.M. Marquis, B.J. Markham and A.K. Jindal, A modified gaseous electronics conference reference cell for the study of plasma-surface-gas interactions, Gaseous Electronics Conference, Houston, TX October 24-27, 2000, Bulletin of the American Physical Society 45 (2000).

    41. [Return to main page]

  41. A.K. Jindal, J.M. Marquis, B.J. Markham and M.J. Goeckner, A flexible plasma system for the study of plasma-surface-gas interactions, Gaseous Electronics Conference, Houston, TX October 24-27, 2000, Bulletin of the American Physical Society 45 (2000).

    42. [Return to main page]

  42. J.M. Marquis, S. Srinivasan, M.H. Khater, L.J. Overzet and M.J. Goeckner, Inductively coupled plasma source symmetry in the presence of a current node, Gaseous Electronics Conference, Houston, TX October 24-27, 2000, Bulletin of the American Physical Society 45 (2000).

    43. [Return to main page]

  43. E.A. Joseph, S.P. Sant, L.J. Overzet, M. Goeckner and M.J. Kushner, Investigation and Modeling of Plasma-Wall Interactions in Inductively Coupled Fluorocarbon Plasmas and the Effects of Chamber Dimension, American Vacuum Society 48th National Symposium, San Francisco, CA, on Oct 28 - Nov 2, 2001.

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  44. A.K. Jindal, S.K. Kanakasabapathy, M.J. Goeckner and L.J. Overzet, A Novel Approach to Time Resolved Langmuir Probe Measurements, American Vacuum Society 48th National Symposium, San Francisco, CA, on Oct 28 - Nov 2, 2001.

    45. [Return to main page]

  45. S. Srinivasan, L.J. Overzet and M.J. Goeckner, ICP Source Designs with Azimuthal Field Symmetry Despite a Current Node, American Vacuum Society 48th National Symposium, San Francisco, CA, on Oct 28 - Nov 2, 2001.

    46. [Return to main page]

  46. L.J. Pratti, J.M. Marquis, M. Goeckner and L.J. Overzet, Scalability of Innovative ICP Source Geometries, American Vacuum Society 48th National Symposium, San Francisco, CA, on Oct 28 - Nov 2, 2001.

    47. [Return to main page]

  47. Y. Lei, E.A. Oakes, M. Goeckner, S.B. Felch, Z. Fang and B.-W. Koo, Study of Pulsed Plasma Doping by Experimental Diagnostics and HPEM Simulations, American Vacuum Society 48th National Symposium, San Francisco, CA, on Oct 28 - Nov 2, 2001.

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  48. S. Srinivasan, L. Pratti, L. Overzet, M.J. Goeckner, Current Nodes on Inductively Coupled Plasma Sources, Gaseous Electronics Conference, Minneapolis, MN, Oct 14-18, 2002, Bull. American Phys. Soc. 47, No. 7, page 45, 2002.

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  49. Ashish Jindal, M.J. Goeckner, L.J. Overzet, FTIR Analysis of Etch Products in Ion-Ion and Electron-Ion Cl2 Discharges, Gaseous Electronics Conference, Minneapolis, MN, Oct 14-18, 2002, Bull. American Phys. Soc. 47, No. 7, page 21, 2002.

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  50. M.J. Goeckner, E.A. Joseph, Y. Liu, L.J. Overzet, S. Sant, B. Zhou, The modified Gaseous Electronics Conference (mGEC) research reactor, Gaseous Electronics Conference, Minneapolis, MN, Oct 14-18, 2002, Bull. American Phys. Soc. 47, No. 7, page 19, 2002.

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  51. Yu Lei, L.J. Overzet, S.B. Felch, Ziwei Fang, B.-W. Koo, M.J. Goeckner, Langmuir probe diagnostics of pulsed plasma doping system, Gaseous Electronics Conference, Minneapolis, MN, Oct 14-18, 2002, Bull. American Phys. Soc. 47, No. 7, page 42, 2002.

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  52. B. Zhou, E.A. Joseph, Y. Liu, L.J. Overzet, M.J. Goeckner, Studies of plasma chemistry in a modified Gaseous Electronics Conference (mGEC) research reactor, Gaseous Electronics Conference, Minneapolis, MN, Oct 14-18, 2002, Bull. American Phys. Soc. 47, No. 7, page 19, 2002.

    53. [Return to main page]

  53. S. Sant, E.A. Joseph, Y. Liu, L.J. Overzet, B. Zhou, M.J. Goeckner, Simulation of plasma chemistry in a modified Gaseous Electronics Conference (mGEC) research reactor, Gaseous Electronics Conference, Minneapolis, MN, Oct 14-18, 2002, Bull. American Phys. Soc. 47, No. 7, page 19, 2002.

    54. [Return to main page]

External funding for original investigations: Title: RESEARCH RELATED TO PLASMA DOPING (PLAD) PI: Matthew Goeckner Funding agent: Varian Semiconductor Equipment Associates 10/1/00-12/31/01, $63,000 Title: A STUDY OF THE INTERACTIONS BETWEEN SURFACES, NEUTRAL GAS AND THE PLASMA IN LOW-TEMPERATURE DISCHARGES. PI: Matthew Goeckner, Co-PI: Lawrence J Overzet (Mark J Kushner - unfunded) Funding agent: National Science Foundation/Department of Energy 8/1/00-7/31/03, $419,000 1/15/03, REU Supplemental $10,000 (Additional support: $2,000 from UTD) Title: ACQUISITION OF A PLASMA SCIENCE RESEARCH AND RESEARCH TRAINING LABORATORY AT UTD PI: Lawrence J Overzet, Co-PIs: Matthew Goeckner, Austin Cunningham, Rod Heelis and Greg Earle Funding agent: National Science Foundation 8/1/00€7/31/02, (no cost extension to 7/03) $579,898 (Additional support: $260,656 from UTD) Title: HIGH DENSITY PLASMA SOURCE TECHNOLOGY PI: Lawrence J Overzet, Co-PI: Matthew Goeckner Funding agent: Texas Coordinating Board Applied Technology Program 1/01/00€12/31/01, $78,805 (Additional support: $30,000 from UTD) Bachelors honors thesis advisement/direction: Aaron Lyles, Spring 2001 Development of a Point Plasma Source Ashish Jindal, Spring 2001 Langmuir Probe Measurements in Pulsed Discharges Ernest Oaks, ? Incomplete (On modeling of plasma sheaths) Bachelors thesis (Senior Project) advisement/direction: Brent Markham, Spring 2000 Ky Ma Spring 2001 Other (often as secondary advisement) Damien Lenoble (Ph.D. student CNET/France Telecom - Varian), Ce Li, Jaeyoung Park, Z.H. Wang (Ph.D. students - Princeton), Len Mahoney, Dan Beale, Jeff Tobin (Ph.D. students - U. Wisconsin), Amy Matthews, Robert Speth (Undergraduate - U. Wisconsin), Michael Henderson (REU student - U. Wisconsin) Classroom teaching: Summers 1995-97 Princeton University (Unpaid) Lecturer and Laboratory Teacher Historically Black Colleges and Universities Summer Program National Undergraduate Fellowship Program