The ATC 1500 sputter deposition system, by AJA International, has the capability to
co-sputter conductive and insulating materials on substrates up to 100 mm in diameter.
In addition to Ar sputtering, N2 and O2 are also available for use in reactive-ion sputtering.
The tool is equipped with 2 RF and 2 DC magnetron sources with in-situ tilt capability
to optimize film uniformity. The substrate is capable of heating to 800 C while under
rotation as well as exposure to reactive gasses and RF bias. Software for control of
the various source shutters is also available for automated film stack deposition.