The ATC 1500 sputter deposition system, by AJA International, has the capability to
co-sputter conductive and insulating materials on substrates up to 100mm in diameter.
In addition to Ar sputtering, N2 and O2 are also available for use in reactive-ion sputtering.
The tool is equipped with 2 RF and 2 DC magnetron sources with in-situ tilt capability
to optimize film uniformity. The substrate is capable of heating to 800C while under
rotation as well as exposure to reactive gasses and RF bias. Software for control of
the various source shutters is also available for automated film stack deposition.