The University of Texas at Dallas

Natural Science and Engineering Research Laboratory

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10nm Al2O3

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10nm Al2O3

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10nm Al2O3 BV

10nm Al2O3 CV

Cambridge Atomic Layer Deposition (ALD) Tool

The Cambridge Atomic Layer Deposition  (ALD) tool deposits thin film dielectrics such as aluminum oxide and hafnium oxide.

March, 2013, Gordon Pollack, University of Texas at Dallas