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The University of Texas at Dallas |
Natural Science and Engineering Research Laboratory
NSERL Cleanroom Tools
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Documentation |
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User Manual |
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Process Data |
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10nm Al2O3 |
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Control Chart |
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10nm Al2O3 |
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MOSCAP Data |
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10nm Al2O3 BV |
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10nm Al2O3 CV |
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Cambridge Atomic Layer Deposition (ALD) Tool |
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The Cambridge Atomic Layer Deposition (ALD) tool deposits thin film dielectrics such as aluminum oxide and hafnium oxide. |
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