ALLOWABLE SUBSTRATES AND DEPOSITED FILMS FOR THERMAL BAY EQUIPMENT
TOOL ID TOOL DESCRIPTION Substrates Allowed Possible Deposited Layers
      1 2 3 4 5 6
TA01 THERMCO Minibrute Stack 4-Tube                
  Process Tube 1 Si Si3N4 SiO2        
  Process Tube 2 Si Metals          
  Process Tube 3 Si Si-friendly metals          
  Process Tube 4 Si Si3N4 SiO2        
TA02 Atmospheric Furnace Stack 4-Tube               
  Process Tube 1 Si Si3N4          
  Process Tube 2 Si Poly Si          
  Process Tube 3 Si Poly Si          
  Process Tube 4 Si SiO2          
TC01 Atomic Layer Deposition HOPG, Si La2O3 Al2O3 HfO2      
TD03 Special Coating Systems Parylene Labcoater Si, SiO2 Au BiTe Cr Pentacene Si, Si3N4, SiO2 TaN
TL01 TYSTAR LPCVD Stack 4-Tube                
  Process Tube 1 Si Poly Si Si3N4 SiO2      
  Process Tube 2 Si Poly Si Si3N4 SiO2      
  Process Tube 3 Si Poly Si Si3N4 SiO2      
  Process Tube 4 Si Poly Si Si3N4 SiO2      
TR01 JETFIRST jipelec RTA Ge, Si La2O3 HfO2 Si3N4 SiO2 ZrO2  
TR02 Modular Process Technology RTP-600S GaAs Si          
TR03 Modular Process Technology RTP-600S Exotics Bi GaAs Si