ALLOWABLE SUBSTRATES AND DEPOSITED FILMS FOR THERMAL BAY EQUIPMENT
TOOL ID	TOOL DESCRIPTION	Substrates Allowed	Possible Deposited Layers
			1	2	3	4	5	6
TA01	THERMCO Minibrute Stack 4-Tube
	Process Tube 1	Si	Si3N4	SiO2
	Process Tube 2	Si	Metals
	Process Tube 3	Si	Si-friendly metals
	Process Tube 4	Si	Si3N4	SiO2
TA02	Atmospheric Furnace Stack 4-Tube
	Process Tube 1	Si	Si3N4
	Process Tube 2	Si	Poly Si
	Process Tube 3	Si	Poly Si
	Process Tube 4	Si	SiO2
TC01	Atomic Layer Deposition	HOPG, Si	La2O3	Al2O3	HfO2
TD03	Special Coating Systems Parylene Labcoater	Si, SiO2	Au	BiTe	Cr	Pentacene	Si, Si3N4, SiO2	TaN
TL01	TYSTAR LPCVD Stack 4-Tube
	Process Tube 1	Si	Poly Si	Si3N4	SiO2
	Process Tube 2	Si	Poly Si	Si3N4	SiO2
	Process Tube 3	Si	Poly Si	Si3N4	SiO2
	Process Tube 4	Si	Poly Si	Si3N4	SiO2
TR01	JETFIRST jipelec RTA	Ge, Si	La2O3	HfO2	Si3N4	SiO2	ZrO2
TR02	Modular Process Technology RTP-600S	GaAs	Si
TR03	Modular Process Technology RTP-600S	Exotics	Bi	GaAs	Si