The MPTC RTP-600 is a compact, single-wafer, desk-top rapid thermal
process system that is capable of rapidly heating samples from ambient up to 1200 C. The tool
features an easily interchangeable quartz heating
chamber with closed-loop temperature control and
programmable Time-Temperature profiles. The
reaction chamber is configured to hold 100 mm wafers.
The UTD Cleanroom has two of these tools. One unit
is plumbed with nitrogen and oxygen and the other
with nitrogen and forming gas.