The University of Texas at Dallas

Natural Science and Engineering Research Laboratory

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NSERL Cleanroom Tools

Process Data


Tube 5: General Oxidation

Tube 6: Gate Oxidation

Tube 7: P-Type Diffusion

Tube 8: N-Type Diffusion

Control Charts


Tube 5: 10nm Oxide

Tube 5: 10nm Oxide

MOSCAP Data


Tube 5: 10nm Oxide BV

Tube 5: 10nm Oxide CV

Tube 6: 10nm Oxide BV

Tube 6: 10nm Oxide CV

Tystar Atmospheric Furnace

The four-stack Tystar atmospheric furnace tool provides the basic oxidation and annealing capabilities needed for silicon transistor and MEMS fabrication on wafers up to 150 mm in diameter. The system is presently configured with two oxidation tubes and two tubes for solid-source diffusion and annealing of N and P type dopants. The furnaces are fully computer-controlled and feature automated load/unload stations and remote recipe editing and download.

March, 2013, Gordon Pollack, University of Texas at Dallas