The four-stack Tystar atmospheric furnace tool provides
the basic oxidation and annealing capabilities needed for
silicon transistor and MEMS fabrication on wafers up to
150 mm in diameter. The system is presently configured
with two oxidation tubes and two tubes for solid-source
diffusion and annealing of N and P type dopants. The furnaces are fully
computer-controlled and feature automated load/unload
stations and remote recipe editing and download.