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Unaxis 790 PECVD

The Plasma Enhanced Chemical Vapor Deposition Unaxis 790 PECVD tool is configured to deposit high-quality silicon dioxide silicon nitride, silicon carbide and amorphous silicon films to temperatures from 100 C to 300 C. The tool was donated to UTD in May 2004 by the Mykrolis Corporation.

November, 2014, Gordon Pollack, University of Texas at Dallas