The fabrication of nanoscale objects is done using an FEI Nova 200 NanoLab system. The system uses focused ion beam (FIB) technology to etch into or deposit onto materials in the nano-scale. There are five gas injection systems available for use in the deposition and etching processes. The FEI Nova 200 system is a combination system consisting of a dual column SEM/FIB which allows simultaneous ultra-high resolution scanning electron microscopy (SEM) and FIB. FIB, with a resolution of 7 nm at 30 kV, allows for the creation of highly detailed and three-dimensional nanostructures. Nanoscale structures are manipulated using the Zyvex F100 Nano-Manipulator system.
 

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