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Plasma Science and Applications Laboratories

L. Overzet,       Strasbourg, 2009. 

Welcome to my Webpage


BSEE, MSEE and  Ph.D in Electrical Engineering, University of Illinois at Urbana-Champaign.    

Assistant Professor, The University of Texas at Dallas (UTD) 1988. 

Associate Professor,  UTD 1994. 

Full Professor, UTD 2000, and

Associate Head of EE Dept.  UTD 2006 to present.  

Senior Member of the IEEE, Member of the AVS, and a registered Professional Engineer in the State of Texas.

Research Interests:

The primary focus of my research is on the plasmas used in semiconductor device manufacturing. The research is primarily experimental in nature although I have performed some plasma simulations and will be doing it more. In particular, my group is best known for our research into pulsed plasmas and ion-ion plasmas. Pulsed-plasmas have the plasma source turned on-and-off periodically, while ion-ion plasmas have only positive and negative ions in them and no electrons. Both have significant advantages over continuous electron-ion dominated plasmas. I and my students have developed several diagnostics for studying these plasmas and consequently have extensive experience in determining plasma kinetics.  These projects have been supported by the NSF, DoE, State of Texas, and several companies.   2009 projects include work for SRC (Deep Si Etch), Photronics (Mask etch) and DoE (Micro-Misted plasmas). 

Teaching Interests:

I have taught over 10 different courses including: "Solid State Electronic Devices" at both the UG (EE3310) and grad (EE6320) levels, and three courses on Plasmas: “Technology of Plasma Class and Laboratory”  for UGs (EE4391), "Plasma Technology" (EE5383), and  "Plasma Science" (EE6383). 

L. Overzet

Mailing Address:

800 W. Campbell Road, RL10

Richardson TX 75080-3021. 

To Contact me:

Phone: 972-883-2154

Fax: 972-883-5725 (But I rarely check this!)


N2 Plasma in GEC cellAr plasma in GECOxygen Plasma in mGEC

O2 Plasma in the mGEC Reactor. 

CFx deposition from a Fluorocarbon Plasma

N2 Plasma in the GEC Reference Cell