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Advantages of modulated-power plasma processing.
Advantages of modulated-power plasma processing.
- Dust particle formation can be diminished.
- Y. Watanabe et. al. Appl. Phys. Lett. 53, 1263-5 (1988). Modulation caused
a drastic suppression of powder concentration in the discharge space.
- C. Courteille et. al. Plasma Sources Sci. Technol. 5, 210-5 (1996). The data
suggest that negative ions are involved in powder formation for these plasma conditions in which particles appear slowly, many seconds after plasma ignition.
- Etch/deposition rate can be maintained despite lower power.
- R. Boswell and D. Henry, Appl. Phys. Lett. 47, 1095-7 (1985). SF6 Si etching
for pulse durations less than 10 ms the etch rate has increased to the continuous discharge value, although the duty cycle has been kept constant at 20%.
- C. Charles et. al. Appl. Phys. Lett. 67, 40-42 (1995). For SiO2
as the pulse frequency increases from 0.1 to 100Hz, the deposition rate increases and equals that for a continuous plasma.
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