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UNDER RECONSTRUCTION (slowly...) Updated: 10/97

Now we can ask: Why should a pulsed plasma help?

Now we can ask: Why should a pulsed plasma help?

Trenching, notching and charging damage can be reduced.

e-

n+

Charge can build up between the

top and bottom of a well during a

continuous discharge. (Te is large.)

This can deflect the ions!

e-

n+

Charge

Þ

The charge buildup can be reduced

in pulsed discharges because the

low ne, Te in the afterglow regime allows

more negative ions and electrons to be

pulled to the well bottom and neutralize

the positive charges.

ÅÅÅ

Poly

Oxide/Si wafer

Photo

Poly

Oxide/Si wafer

Photo

e-

n+

E

E

E

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