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UNDER RECONSTRUCTION (slowly...)   Updated: 10/97

Why should a pulsed plasma help?

Why should a pulsed plasma help?

  • Discharge chemistry can be altered. (Properties of deposited films can be altered, Etch/deposition rate can be maintained despite lower power.)
    • The time variation in the source power changes the electron energy and density. Consequently: Both higher and lower energy electrons can be formed to react.
    • When the power is off:
      • electron energy goes low, attachment can become large!
      • negative ion chemistry can be different than neutral or positive ion chemistry.
      • Loss rates for neutral radicals can vary significantly.
    • When the power turns on:
      • electron energy can spike high,
      • increased dissociation and ionization.

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