Welcome to Lawrence J. Overzet's Web Pages

UNDER RECONSTRUCTION (slowly...)   Updated: 10/97

 
Welcome to
Lawrence J. Overzet's
Resume Page.

 
Addresses:
Home:  
877 Harvest Glen Drive 
Plano, TX 75023-6825. 
[email protected] 
 
 
University of Texas at Dallas:  
Program in Electrical Engineering 
PO Box 830688, EC33 
Richardson, TX 75083-0688. 
(972)883-2154. 
Fax: (972)883-6839 
Educational History:
  • B. S. in Electrical Engineering, May, 1983, University of Illinois, College of Engineering, Urbana, IL. E. C. Jordan award, Schlumberger Scholarship award, Bronze Tablet (Summa Cum Laude) with High Honors.
  • M. S. in Electrical Engineering, January, 1986, University of Illinois, College of Engineering, Urbana, IL. “Electron Density Dependencies of RF Discharges in Silane and Helium.” under Dr. Joseph T. Verdeyen. I was the Recipient of an American Electronics Association Fellowship.
  • Ph.D. in Electrical Engineering, October, 1988, University of Illinois, College of Engineering, Urbana, IL. “Enhancement of the Negative Ion Flux to Surfaces from Radio Frequency Processing Discharges.” under Dr. Joseph T. Verdeyen.
Employment History: Principal positions since the Bachelor’s degree:
  • Assistant Professor in Electrical Engineering, Sept. 1988 - Sept. 1994. Erik Jonsson School of Engineering and Computer Science, University of Texas at Dallas.
  • Associate Professor in Electrical Engineering, Sept. 1994 - present. Erik Jonsson School of Engineering and Computer Science, University of Texas at Dallas.
Courses taught:
  • Undergraduate:
    • Solid State Electronic Devices; Introduction to Electromagnetic Fields I and II;
  • Graduate:
    • Semiconductor Device Theory I; Physical Properties of Semiconductors; Laser Electronics I; Semiconductor Processing Technology; Semiconductor Process Integration; Plasma Processing Technology; Plasmas for Materials Processing, and Current Topics in Plasma Processing.
Professional recognitions, honors, memberships, etc., (study, teaching, research, service):
    Member of the IEEE, American Vacuum Societies
Achievements in original investigation:
Invited articles in refereed journals:
  1. “Negative ion extraction from pulsed discharges.” L. J. Overzet, Brian A. Smith, Jennifer Kleber and Sivananda K. Kanakasabapathy. Jpn. J. Appl. Phys. 36, 2443-2449 (1997).
  2. “Microwave diagnostic results from the GEC reactor.” L. J. Overzet, Journal of Research of The National Institute of Standards and Technology. 100, 401-414 (1995).
Articles in refereed journals:
  1. "Improvements to the floating double probe for time resolved measurements in pulsed rf plasmas”, B. A. Smith and L. J. Overzet, Accepted Review of Sci. Instrum. (1997).
  2. “Ion energy control in an insulating inductively coupled discharge reactor.” Brian A. Smith and L. J. Overzet, Appl. Phys. Lett. 70, 1950-1952 (1997).
  3. “Time resolved power and impedance measurements of pulsed radio frequency discharges.” L. J. Overzet and F. Y. Leong-Rousey, Plasma Sources Sci. Technol. 4, 432-443 (1995).
  4. “Time resolved energy distribution of F- from pulsed RF discharges.” B. A. Smith and L. J. Overzet, J. Appl. Phys. 5195-5197 (1995).
  5. “Spatial variations in the charge density of argon discharges in the Gaseous Electronics Conference reference reactor.” L. J. Overzet and M. B. Hopkins, Appl. Phys. Lett. 63, 2484-2486 (1993).
  6. “Comparison of electron density measurements made using a Langmuir probe and microwave interferometer in the Gaseous Electronics Conference reference reactor.” L. J. Overzet and M. B. Hopkins, J. Appl. Phys. 74, 4323-4330 (1993).
  7. “Model for charge movement after the radio frequency excitation is extinguished.” L. J. Overzet, J. Vac. Sci. Technol. A 11, 1114-1118, (1993).
  8. “Negative and positive ions from CF4 and CF4/O2 RF discharges in etching silicon.” Y. Lin and L. J. Overzet, Appl. Phys. Lett. 62, 675-677 (1993).
  9. “Modeling and measurements of the negative ion flux from amplitude modulated RF discharges.” L. J. Overzet, Y. Lin and L Luo, J. Appl. Phys. 72, 5579-5592 (1992).
  10. “Negative and positive ions from radio frequency plasmas in boron trichloride.” L. J. Overzet and L Luo, Appl. Phys. Lett. 59, 161-163 (1991).
  11. “Modulated discharges: Effect on plasma parameters and deposition.” J. T. Verdeyen, J. H. Beberman, and L. J. Overzet, J. Vac. Sci. Technol. A 8, 1851-1856 (1990).
  12. “Enhancement of the Negative Ion Flux to Surfaces from Radio Frequency Processing Discharges.” L. J. Overzet, J. H. Beberman, and J. T. Verdeyen, J. Appl. Phys. 66, 1622-1631 (1989).
  13. “Enhancement of the Plasma Density and Deposition Rate in RF Discharges.” L. J. Overzet and J. T. Verdeyen, Appl. Phys. Lett. 48, 695 (1986).
Articles appearing as chapters in edited volumes:
  1. “Time resolved measurements of pulsed discharges: The role of metastable atoms in the afterglow.” L. J. Overzet and J. Kleber, in Proceedings of the NATO Advanced Research Workshop on Electron Kinetics in Plasmas, St. Petersburg Russia, edited by U. Kortshagen and L. Tsendin (Plenum Press, New York, NY, 1997), 14 pages.
  2. “Negative and positive ions from CF4 and CF4/O2 RF discharges in etching silicon.” L. J. Overzet, Y. Lin and L Luo, in 36th Annual Technical Conference Proceedings, (Society of Vacuum Coaters, Albuquerque, NM 1993), pp. 343-347.
  3. “The dependencies of negative ions from pulsed radio-frequency discharges.” L. J. Overzet, Y. Lin and L Luo, in Electrochemical Society Symposia Proceedings, edited by G. S. Mathad and D. W. Hess (Electrochemical Society, Pennington, NJ, 1992), Vol. PV92-18, pp. 64-74.
  4. “The Effects of Modulation on an RF Discharge in Silane and on the Deposited a Si:H.” L. J. Overzet, J. T. Verdeyen, R. M. Roth, and F. F. Carasco, in Materials Research Society Symposia Proceedings, edited by D. Apelian and J. Szekely (Materials Research Society, Pittsburgh, PA, 1987), Vol. 98, pp. 321-326.
Invited or refereed talks/presentations to professional meetings and seminar or colloquia assemblies:
  1. “Time resolved measurements of pulsed discharges: The role of metastable atoms in the afterglow.” L. J. Overzet and J. Kleber, NATO Advanced Research Workshop on Electron Kinetics in Plasmas, St. Petersburg Russia, 6/97.
  2. “Why and how to pulse a plasma.” L. J. Overzet, B. E. Cherrington, S. Kanakasabapathy, M. Khater, J. Kleber and B. A. Smith, Motorola Inc. Austin, TX 2/97.
  3. “Time resolved measurements of pulsed discharges.” The Symposium on Dry Processing, Waseda University, Tokyo, 11/96. (The Institute of Electrical Engineers of Japan.)
  4. “What happens when you pulse the power to a discharge?” University of Wisconsin Engineering Research Center for Plasma Aided Manufacturing Seminar. Madison WI, 4/96.
  5. “Electron density measurements in the GEC reactor.” 48th Annual Gaseous Electronics Conference, Berkeley, CA 10/95. Bull. Amer. Phys. Soc. 40 1572, 1995.
  6. “Discharge turn on and turn off.” IEEE Conference on Plasma Science, Madison, WI, 6/95.
  7. “Measuring the negative ions in radio-frequency discharges.” Local Electrochemical Society Seminar, Dallas, TX 1/93.
  8. “Measuring the electron density in processing plasmas by microwave interferometry.” Texas Instruments Incorporated, Dallas, TX 4/91.
  9. “A practical microwave technique to measure low electron densities.” Texas Instruments Incorporated Seminar, Dallas, TX 2/90.
  10. “Modulated discharges: Effect on plasma parameters and deposition.” J. T. Verdeyen, J. H. Beberman, and L. J. Overzet, American Vacuum Society National Meeting, Boston, MA 10/89.
Selected Contributed (unrefereed) abstracts and/or presentations at professional meetings:
  1. “Ignition of pulsed inductively coupled plasmas in the GEC Reference Reactor.” B. E. Cherrington, L. J. Overzet, and R. Massetti, 50th Annual Gaseous Electronics Conference, Madison WI, 10/97. Bull. Amer. Phys. Soc. 42 1712, 1997.
  2. “Measurements of the transition to a positive ion - negative ion plasma.” B. A. Smith, L. J. Overzet, B. E. Cherrington, 50th Annual Gaseous Electronics Conference, Madison WI, 10/97. Bull. Amer. Phys. Soc. 42 1712, 1997.
  3. “A two-coupled sheath simulation of RF chuck bias.” S. K. Kanakasabapathy and L. J. Overzet, 50th Annual Gaseous Electronics Conference, Madison WI, 10/97. Bull. Amer. Phys. Soc. 42 1749, 1997.
  4. “Measurements of an inductively coupled plasma source for microelectronics processing.” M. H. Khater, L. J. Overzet, and B. E. Cherrington, 50th Annual Gaseous Electronics Conference, Madison WI, 10/97. Bull. Amer. Phys. Soc. 42 1750, 1997.
  5. “DC sheath resistance of capacitively coupled discharges in the GEC reactor.” Lawrence J. Overzet, Blake E. Cherrington, Jennifer Kleber, Kangsoo Yi, and Michael B. Hopkins, 49th Annual Gaseous Electronics Conference, Argonne IL, 10/96. Bull. Amer. Phys. Soc. 41 1335, 1996.
  6. “Time resolved negative ion flux from a pulsed inductive discharge.” L. J. Overzet and B. A. Smith, 49th Annual Gaseous Electronics Conference, Argonne IL, 10/96. Bull. Amer. Phys. Soc. 41 1301, 1996.
  7. “Time resolved measurements of pulsed RF discharges.” L. J. Overzet, M. B. Hopkins, C. Bowles, B. Smith, and F. Gu, 42nd National Symposium of the American Vacuum Society, Minneapolis, MN, 10/95.
  8. “Ion energy distributions from a helical resonator discharge.” B. A. Smith and L. J. Overzet, 48th Annual Gaseous Electronics Conference, Berkeley, CA, 10/95. Bull. Amer. Phys. Soc. 40 1554, 1995.
  9. “Time resolved plasma parameter measurements in pulsed discharges.” L. J. Overzet, C. Bowles, M. B. Hopkins and B. A. Smith, 48th Annual Gaseous Electronics Conference, Berkeley, CA, 10/95. Bull. Amer. Phys. Soc. 40 1582, 1995.
  10. “The effect of metastable-metastable collisional ionization on the electron energy distribution function of pulsed discharges.” L. J. Overzet, M. B. Hopkins and C. Bowles, 48th Annual Gaseous Electronics Conference, Berkeley, CA, 10/95. Bull. Amer. Phys. Soc. 40 1578, 1995.
  
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University of Texas at Dallas,
P.O. Box 830688, EC33
Richardson, TX 75083-0688
Tel: (972)883-2154
Fax: (972)883-6839
email: [email protected]
 

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