Research

•     Theory:     

          > Error Analysisi and Optimization Techniques in Scatterometry for Semiconductor Sub-Micron Metrology

              (click here for PhD Proposal: Documentation , Presentation)   

•     Instrumentation:

          > Angular Scanning Scatterometer for CD Measurements    (click here for image1, image2, image3, image4)   

•     Fabrication:

          > E-beam resist (PMMA)  Gratings on Silicon Wafers for CD Test Structures    (click here for SEM pictures:  pic1, pic2, pic3, pic4)

•     Interests:

          > Optical Metrology, Inverse Problems, Diffractive Optics, Periodic Structures, Metamaterials, Photonic Circuits

•     Publications: 

  > Mathematical analyses of inverse scatterometry    (click here for abstract, full PDF document)  

       E. M. Drege, Rayan M. Al Assaad, D. M. Byrne

       Proc. SPIE Vol. 4689 I, 2002, pp. 151-162                                                                              

    > Profile parameters accuracy determined from scatterometric measurement    (click here for abstract, full PDF document)                         

       Rayan M. Al Assaad, E. M. Drege, D. M. Byrne

       Proc. SPIE Vol. 4692, 2002, pp. 17-28                                                                             

    > Error analysis in inverse scatterometry I : Modeling      (click here for pre-print)

       Rayan M. Alassaad, D. M. Byrne

       Optical Engineering (in print)

    > Error analysis in inverse scatterometry II : Optimization      (click here for abstract)

       Rayan. M. Alassaad, D. M. Byrne

       Applied Optics (in print)

    > Information content analysis in scatterometry     (click here for abstract)     

       Rayan. M. Alassaad, D. M. Byrne

       Applied Optics (in print)

•     Presentations:

  > Profile parameters accuracy determined from scatterometric measurements    (click on picture for slides) 

     SPIE Conference: Design, Process, Integration, and Characterization for  Microelectronics

     March 7-8, 2002, Santa Clara, California

  > The effects of grating profile dimensions on the accuracy of retrieved values in  scatterometry    (click on picture for slides) 

      OSA Conference: Optics in The Southeast

      November 12-13, 2003, Orlando, Florida

•     Projects:

          > Surface relief profile determination of phase masks by inverse scatterometry    (click here for full PDF document) 

             Supported by Photronics, Allen, Texas

             Fall 2002, Electrical Engineering, University of Texas at Dallas

•     Resume:

  > Word download

          > PDF download

Home Page