Sputter Module

The sputter module is equipped with a four RF magnetrons in a confocal geometry for conductive or insulating film deposition on 100 mm substrates.  The module is configured to admit up to 4 gasses for reactive sputtering applications. Substrate heating (to 1000 C, in O2) and rotation are also available.  A 1000 l/s turbo pump and a Ti sublimation pump enables a base pressure in the 10-10 mbar regime, if needed.  Film thickness is monitored with a quartz-crystal microbalance.

The module is integrated with the deposition and annealing modules to enable the control of interfaces throughout the growth process.


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