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Nanotechnology in Manufacturing for Semiconductor Applications and Beyond, pressented by Assoc. Prof. Dr. G. Bahar Basim as part of the Materials Science and Engineering Colloquium Series
Friday, Mar 16
11 a.m. - 12 p.m. Location: RL 3.204

ABSTRACT: Adaptation of nanotechnology in manufacturing requires close collaboration and interdisciplinary approach between academia and industry to be successful. This talk focuses on the nanotechnology implementations to enable next generation semiconductor industry that is dealing with atomic scale devices. The particular focus is on the accomplishments in the microelectronics applications of Chemical Mechanical Planarization (CMP) process, which is extensively used for the development of current and future semiconductor applications to enable multilayer metallization. Some high-end examples are: Metal CMP applications of the tungsten T-gate transistors, Germanium based high-speed shallow trench isolation transistors and high-power transistors and LED applications where III/V semiconductors, such as GaN, are used.  Furthermore, new extensions of the CMP process are introduced for biomaterials, and also for conventional metals such as steel used for heating elements and aluminum used for airplane bodies to improve their biocompatibility, corrosion resistance and durability through inducing enhanced surface film characteristics and controlled nano-structuring. Nanotechnology implementations on textile and plastics industries to promote smart materials with self-cleaning and self-healing abilities are also introduced as alternative implementations of nanotechnology in manufacturing.

BIO: Dr. Bahar Basim's research experience and interests extend within the applications nanotechnology in manufacturing.  She has graduated from the University of Florida Materials Science and Engineering Department in 2002 with specializations in particle science and technology and electronic materials. Her doctorate dissertation was supported by the National Science Foundation Engineering Research Center for Particle Science and Technology and focused on slurry design for chemical mechanical planarization (CMP) process. After graduation, she has worked as a process and integration engineer for Intel Corporation in Santa Clara CA and joined Texas Instruments Incorporated in Dallas TX, where she contributed to CMP process development, non-volatile memory product development and process integration of ferroelectric memory device manufacturing.  Dr. Basim joined academia in September 2009 as a founder of the Ozyegin University in Istanbul Turkey, where she is currently an Associate Professor and member of various administrative committees in addition to the social responsibilities such serving as the advisor of the Women in Engineering Network. She is currently visiting with the Venture Development Center at the UTD.

Contact Info:
Jennifer Alsbury, 972-883-5754
Questions? Email me.

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